| 摘要 |
A method of manufacturing a curved diffraction grating is disclosed. The grating is made of a single crystalline silicon substrate, one major plane thereof being provided with a plurality of asymmetric triangular grooves, each having a wall inclined by an angle theta with respect to the major surface so as to satisfy an equation <CHEM> where theta represents the blaze angle, P the grating constant of the groove, lambda B the blazing wavelength, and m the order of diffraction. The walls of each groove receiving incident light are covered with a metal coat. The diffraction grating is prepared by using an {hkl} plane (where h = k) inclined by theta with respect to the {111} plane of the single crystalline silicon as a major surface, and then anisotropic etching the major surface through an etching mask having stripes of sufficiently smaller width than the constant. The planar diffraction grating thus obtained is mounted on a curved surface of a supporting member and, by applying pressure, curved to conform with the curved surface. Preferably, following the anisotropic etching, isotropic etching is performed for the major surface. |
