| 摘要 |
<p>PURPOSE:To prevent the yield of cracks in wafers, by using a washing tank having a temperature gradient. CONSTITUTION:Pipe openings 12-14 are provided at the central part of the bottom surface of a water tank 11 in the direction of the width at an equal interval. The pipes 12-14 inject hot water streams having different temperatures into the water tank 11. At the upper and lower parts of the water tank, separating plates 21 and 22 are provided in order to prevent the blending of the hot water injected from the openings 12-14. Hot water outlet ports 15-17 are provided at the upper part of the water tank. In this constitution, a gradient is provided in temperature distribution in the water tank in the longitudinal direction. Since rapid temperature change is not imparted to waters at the time of washing in this structure, yielding of cracks can be prevented.</p> |
