发明名称 FORMATION OF FILM BY UTILIZING VAPOR PHASE REACTION
摘要 PURPOSE:To form a local covering in short time at a low cost without post working by concealing the non-film part of a work with a cover and closing the spacing between the cover and the work by a difference in the coefft. of thermal expansion between said cover and material to be worked in the stage of forming the film. CONSTITUTION:The non-film part of a circular cylindrical material 5 to be worked is locally concealed by a cover 9. The cover 9 is formed of an ''Invar'' alloy and has he inside diameter slightly larger than the outside diameter of the material. Such material is set on the tray 7 in a reaction furnace and the inside of the furnace is heated. Only the gaseous H2 is passed until the reaction temp. is attained. The material 5 expands thermally in an equal direction but the cover 9 does not expand thermally. The spacing between the material 5 and the cover 9 is thereby closed and the part of the material 5 except the exposed part can be shut off from the reactive gaseous atmosphere. If the temp. is lowered after the formation of the film, the material 5 restores the original size and can be therefore easily removed from the cover 9.
申请公布号 JPS60204879(A) 申请公布日期 1985.10.16
申请号 JP19840061382 申请日期 1984.03.27
申请人 MITSUBISHI DENKI KK 发明人 HASHIMOTO YOUICHI
分类号 C23C16/04 主分类号 C23C16/04
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