| 摘要 |
A process of forming a polyimide pattern on a base plate, which comprises exposing imagewise a layer of photosensitive polyimide precursor on the base plate, removing unexposed areas by developing and curing the resultant pattern of the polyimide precursor, characterized by employing a developer containing (A) at least one solvent selected from the group consisting of N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N,N-dimethylformamide, dimethylsulfoxide and gamma -butyrolactone, (B) methanol and (C) at least one solvent represented by the formula; R1OCH2CH2OCH2CH2OR2 wherein R1 is a hydrogen atom or R2 and R2 is an alkyl group having 1 to 4 carbon atoms.
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