| 摘要 |
PURPOSE:To minimize charging of a target made of an insulator by causing low energy electrons to float around the target when irradiating an ion beam upon the target. CONSTITUTION:When processing, implantation or analysis is performed on a target 5 made of an insulator by irradiating an ion beam 4 upon the target 5, an electron source 20 is installed in the concave area of a table holder 31. Then thermal electrons 21 from the electron source 20 are led into the space formed inside a mesh 23 to netralize the positive electrification caused by the irradiation of the ion beam 4. Therefore, a table 24 placed on an insulator 25, meshes 22 and 13 and the table holder 31 have a negative electric potential relative to the mesh 23, and the electrons 21 are floating and are sealed up inside the mesh 23. As a result, any charging of the target 5 is prevented by neutralizing the positive ionic charges, thereby enabling processing of the target 5 to be performed with high precision. |
