发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To reduce any foreign matters adhering to a wafer by a method wherein a foreign matter peeled off or fallen away from target, device ceiling and sheltering ring etc. is sheltered by a foreign matter sheltering body. CONSTITUTION:A foreign matter sheltering body 14 made of aluminum, stainless and molybudenum etc. is fixed to a device ceiling 6. This foreign matter sheltering body 14 with L type section composed of a ring structure provided with a foreign matter sheltering part 15 protruding toward inner peripheral side is fixed on the peripheral part of a dent 7 to shelter a wafer 1 from a dropping foreign matter 16 as well as to prevent the foreign matter from adhering to the wafer 1. Besides, the sheltering length (l) of foreign matter sheltering part 15 for the peripheral part of a target 4 may be made almost equivalent to 1/2 of the distance (L) from the target 4 to the foreign matter sheltering part 15 to make the sheltering most effective.
申请公布号 JPS60200518(A) 申请公布日期 1985.10.11
申请号 JP19840056017 申请日期 1984.03.26
申请人 HITACHI SEISAKUSHO KK 发明人 NONAKA YOSHIO
分类号 H01L21/285;H01L21/203 主分类号 H01L21/285
代理机构 代理人
主权项
地址