| 摘要 |
PURPOSE:To improve the processability by providing a position detecting mechanism which detects a position within a range of following exposure while exposure is carried out at a position within some exposure range through another positioning mechanism independently of another positioning mechanism. CONSTITUTION:A position shift observing mechanism 9 positions a positioning mark 6A on a semiconductor substrate 2 and an exposure mask 1, and then while the exposure range including the positioning mark 6A is exposed, a laser beam (b) emitted by a beam source 10 is photodetected by a sensor 11 to detect the position of a positioning mark 6B within a following exposure range by scanning the laser beam (b); and the shift of the position from the position 6A is corrected and the substrate is moved to under a microprojection lens 3. Consequently, the positioning mark 6B is observed through the position shift observing mechanism 9 in a short time without any position shift. |
