EINRICHTUNG ZUM REAKTIONSGASEINLASS BEIM PARTIELLEN REAKTIVEN PLASMATRONSPUTTERN,申请号DD19830256026-传众专利搜索

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发明名称	EINRICHTUNG ZUM REAKTIONSGASEINLASS BEIM PARTIELLEN REAKTIVEN PLASMATRONSPUTTERN
摘要
申请公布号	DD228421(A3)	申请公布日期	1985.10.09
申请号	DD19830256026	申请日期	1983.10.27
申请人	VEB KERAMISCHE WERKE HERMSDORF,DD	发明人	BILZ,HARALD,DD;DIETRICH,WILFRIED,DD;EISENSCHMIDT,FRANK,DD
分类号	C23C14/34;(IPC1-7):C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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