| 摘要 |
Zone plate alignment aids on a mask and semiconductor wafer are used in a projection type system for aligning the wafer and mask prior to transfer of a circuit pattern from the mask to the wafer in an exposure process. The condenser system includes an aperture in the shape of a chevron or other convenient alignment pattern while the viewing system of the device is provided with a complementary shaped pupil stop. The condenser aperture and the viewing system stop cofunction to enhance the image contrast seen through the viewing system.
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