发明名称 PHOTORESIST COMPOSITION
摘要 PURPOSE:To enhance resolution, storage stability, etc., by incorporating gamma-aminopropyltrihydroxysilane dehydration condensate in a photosensitive compsn. contg. a water-soluble polymer and a bisazide type photocross-linking agent. CONSTITUTION:The present photoresist compsn. having good resolution and superior adhesion is prepared by mixing about 1-30pts.wt. of a bisazide type photocross-linking agent, such as 4,4'-diazidostilbene-2,2'-disulfonic acid or its salt, with 100pts.wt. of a water-soluble polymer, such as polyacrylamide, polyvinylpyrrolidone, or gelatin, to prepare a photosensitive compsn., and incorporating gamma-aminopropyltrihydroxysilane dehydration condensate represented by the formula (n is an integer of 2-20) in this photosensitive compsn. in an amt. of 0.01- 20pts.wt. per 100pts.wt. of the water-soluble polymer.
申请公布号 JPS60198535(A) 申请公布日期 1985.10.08
申请号 JP19840053507 申请日期 1984.03.22
申请人 TOSHIBA KK 发明人 ISORI KUNIHIRO
分类号 G03C1/00;G03F7/008;G03F7/038;G03F7/075 主分类号 G03C1/00
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