| 摘要 |
PURPOSE:To produce easily and exactly a diffraction grating in which rugged phases are reversed from each other according to regions by maksing use of the characteristics possessed by the negative type and positive type of photoresist films. CONSTITUTION:A photoresist film 2 of a positive type in the region A on a substrate 1 and a film 2 laminated on a photoresist film 7 of a negative type in the region B are formed with the ruggedness where the unexposed parts of the films 2 project when said films are exposed by one time of interference light of two luminous fluxes. The films are subjected to an etching treatment, etc. with the projecting parts as a mask to form ruggedness on the substrate 1 in the region A. The entire surface of the film 7 in the region B is then exposed with the ruggedness of the film 2 as a mask and is subjected to a developing treatment, etc. The mask corresponding to ruggedness reversed in phase from the ruggedness of the region A by the film 7 is formed in the region B when the film 2 in the regions A, B is removed after such treatment. The region B is subjected to an etching treatment, etc. by using such mask and the diffraction grating in which the phases of ruggedness are reversed according to the regions is thus easily and exactly formed by one time of exposure of the interference light. |
