| 摘要 |
PURPOSE:To form the groove of a guide pattern on a substrate in a short time, by irradiating ultraviolet rays upon the substrate coated with a photoresist film through a mask plate and etching the guide pattern on the glass substrate after development. CONSTITUTION:After a photoresist film 2 is applied to a glass substrate 1, a mask plate 3 equipped with a guide pattern is brought into close contact with the photoresist film 2, and then, the mask pattern is transferred to the resist film 2 by irradiating ultraviolet rays A. Thereafter, the resist film 2 is developed and grooves are formed in the resist film 2. Then grooves 4 are formed in the glass substrate 1 by etching and after the grooves 4 are formed the resist film 2 is removed. In this way, the groove 4 of the guide pattern is formed in the substrate 1 in a short time. |
