发明名称 VERTICAL HEATING FURNACE
摘要 PURPOSE:To form a ceiling in reduced height of a chamber of be installed while positions of heating surface body and wafer holder are not changed by suspending a wafer holder with a rope and guiding the rope laterally at the specified upper position of aperture in order to move it in the direction of tension. CONSTITUTION:A wafer holder 4 is coupled to a rope 14 and is suspended, the rope 14 extended upward is guided laterally through a pulley 15 and is wound by a winding mechansim 16. The wafer holder 4 is loaded to or unloaded from a heating chamber 3 by opening caps 2, 11 as indicated by the chain lines, taking up or rewinding the rope 14 with the winding mechanism 16 and thereby moving upward of downward the wafer holder 4. The specified position of wafer holder 4 is almost at the center of furnace core tube 1 within the heating chamber 3 or at the upper part of opened cap 11, namely at the position (a) indicated by another two-dotted chain line outside the heating chamber 3.
申请公布号 JPS60195927(A) 申请公布日期 1985.10.04
申请号 JP19840051917 申请日期 1984.03.16
申请人 FUJITSU KK 发明人 HATAISHI OSAMU;YASUDA HIROSHI
分类号 H01L21/205;H01L21/22;H01L21/31 主分类号 H01L21/205
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