发明名称 PLASMA CVD APPARATUS
摘要 PURPOSE:To prevent the generation of a reactive product between a substrate support and a roller, ensure perfect supply of power for generation of glow discharge and prevent mechanical abrasion by allowing existence of the contact portion between the substrate support and drive roller within the space being separated from the glow discharge generating space and is almost closed. CONSTITUTION:A roller 7 is shielded with a cover 11 in order to prevent adhesion of reaction products. The cover 11 forms a space 13 under the sami-closing condition where only a gap 12 required for movement of a tray 9 is opened against the wall of reaction tank 1 and thereby the contact portion between the roller 7 and tray 9 exists within such space 13. As a result, plasma reaction product scarcely adheres to the contact surface between the roller 7 and tray 9, electrical connection between tray 9 and roller is not prevented by an insulating or high resistance film and mechanical abrasion at the surface of roller 7 and the contact surface of tray 9 for the roller is not generated.
申请公布号 JPS60195926(A) 申请公布日期 1985.10.04
申请号 JP19840051837 申请日期 1984.03.16
申请人 FUJI DENKI SEIZO KK 发明人 MURAMATSU YOSHIHISA
分类号 H01L31/04;H01L21/205 主分类号 H01L31/04
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