发明名称 TREATING DEVICE
摘要 PURPOSE:To sufficiently perform a photochemical reaction and to obtain preferable treating result by providing in advance a plurality of preliminary emitting units for emitting a light to a reaction source. CONSTITUTION:A wafer 2 placed on a heater 3 is heated, the iterior of a reaction chamber 1 is exhausted, and reaction gas such as nonosilane or ammonia is supplied from a supply path 5 into a preliminary emitting chamber 6. In this chamber 6, reaction gas is emitted by the light having the prescribed characteristics for wavelength and energy level by a preliminary light source 8, and an electronic system first becomes in an excited state by the light absorption. The reaction gas maintains electronically excited state in the chamber 1 or introduced while advancing the reaction, emitted by the light having the prescribed characteristics by the light source 7, and atoms or ionized group are generated by the direct ionization or previous ionization in the molecules of the electronically excited state, and the reacton is further developed.
申请公布号 JPS60195941(A) 申请公布日期 1985.10.04
申请号 JP19840050941 申请日期 1984.03.19
申请人 HITACHI SEISAKUSHO KK 发明人 YOSHIMI TAKEO;SAKAI HIDEO
分类号 H01L21/205;H01L21/268;H01L21/31 主分类号 H01L21/205
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