| 摘要 |
PURPOSE:To improve the uniformity of distribution in a wafer in the thickness of an oxidized film even when using an electric furnace with a soft landing mechanism by providing a fork supporting the wafer with a function as a cover. CONSTITUTION:In a fork 4 having an outer diameter of 12cm, cylinders 9,10 made of quartz, which have the same diameter as the fork and are 20cm long, are mounted before and behind a section to which a susceptor 2 is set. Both ends of the cylinders are closed, and holes 11,12 of 5mm.phi are bored for air vent. Regarding the cylinder 10, it is left in a core tube even under the state in which the fork is drawn out, and the working range of the fork is adjusted so that it functions as a throat cover. |
