| 摘要 |
PURPOSE:To execute precise positioning rapidly even when an exposure wavelength and an alignment wavelength differ by using an auxiliary lens and introducing a parallel plane glass as required. CONSTITUTION:A space between an original picture on a reticle 1 and a wafer 2 is kept accurately to a (g) line having an exposure wavelength. The image 8 of a pattern 9 illuminated by a (d) line having a wavelength for alignment is imageformed on the reticle 1 while being separated only by a distance rd. When an auxiliary lens 11 is arranged at a distance (b) in the lower section of the reticle 1 at that time, the image of the pattern 9 is image-formed on the reticle 1 as an image 8a. Consequently, positioning is enabled without vertically moving the wafer. When an (e) line is used for the auxiliary lens 11, the image of the pattern 9 for the wafer 2 does not reach the reticle 1 and is image-formed at a position at a distance epsilone from the reticle 1 as an image 8b because the wavelength of the (e) line is shorter than that of the (d) line. When a parallel plane glass 12 is inserted vertically to an optical axis for alignment between the reticle 1 and the auxiliary lens 11, the pattern 9 for the water 2 is image-formed on the reticle 1 as an image 8c. |
