| 发明名称 |
Photo and radiation-sensitive organopolymeric material |
| 摘要 |
A photo and radiation sensitive-organopolymeric material having at least one Si-Si)n bond, wherein n is an integer of from 1 to 5 has a good resistance to dry etching, a good adhesion and a good heat resistance and is useful for finer patterning with a good resolution.
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| 申请公布号 |
US4544729(A) |
申请公布日期 |
1985.10.01 |
| 申请号 |
US19840623168 |
申请日期 |
1984.06.22 |
| 申请人 |
HITACHI, LTD. |
发明人 |
NATE, KAZUO;INOUE, TAKASHI;YOKONO, HITOSHI;ISHIKAWA, MITSUO;KUMADA, MAKOTO |
| 分类号 |
C08G77/48;C08G77/60;G03F7/075;(IPC1-7):C08G77/04 |
主分类号 |
C08G77/48 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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