发明名称 |
Method for more uniformly spacing features in a lateral bipolar transistor |
摘要 |
The unique initial masking step is used in a method of more predictably and uniformly spacing features on a surface of a semiconductor device by combining it with two dielectric maskants. A unique semiconductor device masking is claimed in which semiconductor device features are initially spaced by means of pitch, i.e. line and a contiguous space, instead of just a line in the initial masking.
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申请公布号 |
US4544940(A) |
申请公布日期 |
1985.10.01 |
申请号 |
US19830458166 |
申请日期 |
1983.01.14 |
申请人 |
GENERAL MOTORS CORPORATION |
发明人 |
WEAVER, II, JOHN R.;MCCLURE, NATHANIEL D. |
分类号 |
H01L21/033;H01L21/761;H01L29/735;(IPC1-7):H01L27/04;H01L29/06;H01L29/72 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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