| 摘要 |
PURPOSE:To prevent pinholes and to form a defectless mask by forming a silver halide layer on a Cr film and irradiating light on the side of the Cr film and also through the pinholes on the spots of the silver halide layer. CONSTITUTION:A Cr film 2 is formed on a glass plate 1, then, a silver halide layer 6 is formed on it by coating it with a silver halide soln., and further, a positive resist film 5 is formed on it. When the side of the glass plate 1 is uniformly exposed to light, the light passed through the pinholes reaches the layer 6, and silver is precipitated to block the pinholes 4. The resist layer 5 is imagewise exposed and developed, and the resist film 5 including the layer 6 is removed. Then, the Cr layer 2 is etched, and finally, the remaining layer 5 and the remaining unexposed silver halide layer 6 are removed. The photomask thus formed is baked to flatten the silver halide layer 7. |
