发明名称 METHOD FOR IRRADIATING ELECTRON RAYS IN ELECTRON RAY DEVICE
摘要 PURPOSE:To vary the angle at which electron rays are irradiated upon a sample by installing a movable diaphragm between a final stage focusing lens and focusing lens which is installed in front of the final stage focusing lens and by correcting the excitation of said final stage focusing lens with that of said focusing lens. CONSTITUTION:A movable diaphragm 13 is installed in an arbitrary position located between a second stage focusing lens 11 and a final stage focusing lens 5. The degree of the excitation of the second stage focusing lens 11 can be varied so that the actual image of point (P) is imaged upon an arbitrary position located between points (Q1) and (On) which are in the back of the lens 11 and on the optical axis. The final stage focusing lens 5 diffracts electron rays 6 the orbits of which are altered by the excitational change of the second stage focusing lens 11. The thus diffracted electron rays 6 are then imaged upon the focus of a front objective 2 by the effect of the front objective 2 which is a part of an objective 1. Accordingly it is possible to vary and control the angle at which electron rays are irradiated while maintaining the focus of an electron probe to be located on a sample 7.
申请公布号 JPS60193248(A) 申请公布日期 1985.10.01
申请号 JP19840048124 申请日期 1984.03.15
申请人 KOKUSAI SEIKOU:KK 发明人 YANAKA TAKASHI
分类号 H01J37/26;H01J37/295 主分类号 H01J37/26
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