发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND APPLICATION THEREOF
摘要 PURPOSE:To form a desired semiconductor device by arranging a small size shutter between a molecular beam generating cell and a thin film growth substrate in order to partly shut the molecular beam and changing the position of small size shutter or replacing it with a shutter of the different shape. CONSTITUTION:A substrate 1 is fixed to a substrate holder 2 and Al molecular beam cell 3, As molecular beam cell 4 and Ga molecular beam cell 5 are arranged toward the center at the position in the equal distance from the center of substrate 1. The shutters SH3, SH4, SH5 are provided before the molecular beam cells 3, 4, 5 in order to stop or send the molecular beams. The Al molecular beam 6, As molecular beam 7 and Ga molecular beam 8 generated from the molecular beam cells 3, 4, 5 are projected in such a manner as covering the entire part of substrate 1 but the shadows of molecular beams are formed on the substrate 1 by the small size shutter 9. The small size shutter 9 are separated from the substrate 1 by several mm. to several cm and can be shifted externally. Therefore, a complicated semiconductor device can be formed by changing the shape and position of such small size shutters 9.
申请公布号 JPS60192320(A) 申请公布日期 1985.09.30
申请号 JP19840047137 申请日期 1984.03.14
申请人 CANON KK 发明人 MIYAZAWA SEIICHI
分类号 H01L21/268;H01L21/203;H01S5/00;H01S5/042 主分类号 H01L21/268
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