| 摘要 |
PURPOSE:To obtain a multi-nozzle orifice plate, which is for ink jet and provided with many orifices at small intervals, by arranging single-crystal plates opposite each other through an etching protective layer, supplying both sides of the plates with anisotropic etching and then removing the protective film. CONSTITUTION:For example, a high-impurity-density P<+>-layer is formed by B dope on surface of an Si single-crystal board 1 whose surface on the both sides are ground to mirror finish. And an Si singl-crystal layer 3 is formed into the same thickness as the base board 1 by epitaxial growth, and this is ground to mirror finish by mechano-chemical grinding process. And an etching protective layer 4 is formed on a part of both main surfaces of the single-crystal board, anisotropic etching is provided on the both sides. And then, the P<+>-layer on the center part functions as an etching protective layer, and an etching hole 7, which takes a drill- like shape and whose top comes to the P<+>-layer, is formed. And then, by providing a protective film 5 for preventing interaction with ink, the required multi-nozzle orifice plate 10 is obtained. |
