PROJECTING EXPOSURE DEVICE

摘要

PURPOSE:To enable positioning and the baking of a circuit pattern by beams different from exposure wavelength by inserting one or a plurality of optical systems compensating the chromatic aberration of a projection lens such as a compensating lens into luminous flux for aligning a mark and changing over them. CONSTITUTION:A compensating lens optical system 10 is inserted into luminous flux 8 for mark alignment for aligning a wafer target mark 2b on a wafer 2 with a reticle target mark 6b on a reticle 6. Compensating lenses are manufactured so that the wafer target mark 2b is image-formed accurately to a section in the vicinity of the upper section of the reticle target mark 6b through a projection lens 3 to a wavelength for mark alignment, and arranged so as not to be superposed on luminous flux 5 for baking a circuit pattern. The compensating lenses 11 and 12 are fixed to the compensating lens optical system 10, and a hole 15 in size in which luminous flux for mark alignment can pass without being interrupted is formed.