| 摘要 |
PURPOSE:To prevent a pitch error and to realize an excellent contact state wherein there is no gas confinement by discharging gas between bodies such as a mask and a wafer and bringing the both in contact with each other, and performing exposure. CONSTITUTION:The mask 1 and wafer 3 are set on a mask support base and a wafer chuck 4 which are sealed with a vacuum leak preventing layer 5. The mask 1 and wafer 3 are arranged opposite by a driving device at a specific interval. A vacuum chamber 6 is evacuated through a vacuum line 8 and spaces 14 and 15 are also evacuated through a vacuum line 16. At this time, the mask 1 is pressed against a mask holder 2 across a cushion member 12 because of the atmospheric pressure applied to the top surface of a glassy member 10 and then fixed. The wafer chuck 4 is elevated by a driving means to bring the wafer 4 into contact with the mask 1, and the both are pressed against each other by decreasing the degrees of vacuum of the spaces 14 and 15 to perform exposure. Consequently, a pitch error is prevented and an excellent contact state wherein there in no gas confinement is obtained.
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