| 摘要 |
PURPOSE:To obtain good antistatic ability by incorporating an F-contg. graft polymer derived from a polymerizable monomer and a polymerizable hydrophilic monomer in a photosensitive material constituent layer. CONSTITUTION:At least one of constituent layers contains a polymerizable hydrophobic monomer having at least one F and a polymerizable hydrophilic monomer. It is preferable to form as this polymer, a polymer composed of a stem of the F-contg. monomer component and branches of the hydrophilic monomer component, or vice versa, and still preferable to use, as this graft polymer, an F-contg. graft polymer represented by formula I or II. The use of such a constituent layer can solve problems due to electrostatic charge accompanied by enhancement of sensitivity, high speed processing, high speed manufacture, etc. In formula I , A<1> is a copolymerized hydrophobic monomer unit contg. an ethylenically unsatd. group and F; B<1> is a hydrophobic copolymerized monomer unit having an ethylenically unsatd. group and no F; D<1> is a copolymerized hydrophilic monomer unit having an ethylenically unsatd. group; and R<1> is H or 1-3C alkyl. In formula II, A<2> is a copolymerized monomer unit having at least one F and at least one ethylenically unsatd. group; B<2> is a copolymerized monomer unit having no F and an ethylenically unsatd. group; L<2> is a bivalent bonding group; R<2> is as R<1>; (n) is an average polymn. degree of a hydrophobic monome A<2> of 2-1,000; and eachof x<2>, y<2>, z<2> is a copolymn. percentage of 30-99.99, 0-50, 0.01-20mol%, respectively.
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