发明名称 DISSIMILAR SUPERIMPOSED GRATING PRECISION ALIGNMENT AND GAP MEASUREMENT SYSTEMS
摘要 <p>A substrate (10) having a diffraction grating (20) of a first periodicity formed thereon, a mask (22) having a diffraction grating of a second periodicity formed thereon, the mask and substrate being positioned such that the respective mask and substrate gratings are generally parallel opposing one another on the mask and substrate, means (42) for providing collimated coherent light (24) directed so as to impinge on the mask and substrate gratings, and means for separately collecting (46, 48, 50, 52), recombining (54, 56) and detecting (58, 60) the intensity of at least a first given order of diffracted light beams as respectively diffracted by the mask and substrate gratings.</p>
申请公布号 WO1985004266(A1) 申请公布日期 1985.09.26
申请号 US1984001542 申请日期 1984.09.26
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