发明名称 COATING METHOD OF STEP DIFFERENCE PART
摘要 PURPOSE:To fill up the opening part of a pattern flat and in a short time with a conductor film by a method wherein the pattern is buried with the conductor film as to make film thickness of the coated conductor film of the flat surface between the patterns to be nearly equalized to the sum of height of the step difference part of the pattern and film thickness of the coated conductor film on the step difference part. CONSTITUTION:A molybdenum film 303 is coated according to high-frequency bias sputtering in the sputtering condition as not to generate a groove along the bottom of the opening part of a silicon oxide film 302 on a silicon substrate 301. The molybdenum film 304 is coated by regulating a high-frequency bias voltage or the other sputtering conditions as to make the film coating speed of the molybdenum film to the coated on the flat surface in the opening part to be about two times of the film coating speed of the molubdenum film to be coated on the flat surface on the step difference part of the opening part. When the area of the opening part is small, and the area on the step difference part intending to be flatten is large, sputtering time can be curtailed sharply according to this method.
申请公布号 JPS60189241(A) 申请公布日期 1985.09.26
申请号 JP19840042934 申请日期 1984.03.08
申请人 KOGYO GIJUTSUIN (JAPAN) 发明人 MOGAMI TOORU;MORIMOTO MITSUTAKA;OKABAYASHI HIDEKAZU
分类号 H01L21/3205;(IPC1-7):H01L21/88 主分类号 H01L21/3205
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