发明名称 POWER SOURCE SYSTEM FOR PLATING
摘要 PURPOSE:To improve the quality of a plated film by using separate power sources for a work electrode and an auxiliary electrode placed close to the work electrode and by controlling voltages for the electrodes so as to minimize changes in the thickness and composition of a plated pattern. CONSTITUTION:An article to be plated as a work electrode 3 is placed on the cathode side of a tank 1 contg. a plating soln., and an auxiliary electrode 4 is placed close to the electrode 3. Electric powers are applied to the electrodes 3, 4 from separate power sources 11, 12, and voltages and currents for the electrodes 3, 4 are separately controlled so as to minimize changes in the thickness and composition of a plated pattern. Thus, the quality of a plated film is improved.
申请公布号 JPS60187700(A) 申请公布日期 1985.09.25
申请号 JP19840043177 申请日期 1984.03.07
申请人 FUJITSU KK 发明人 NAKADA TAKESHI
分类号 C25D17/10;C25D21/00 主分类号 C25D17/10
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