发明名称 WAFER SHIFTING APPARATUS FOR VERTICAL HEATTREATMENT FURNACE
摘要 PURPOSE:To get wafers vertically arrayed in the second jig by a method where in the wafers are arrayed in the first jig at specified intervals while the second jig is provided with containing grooves at equivalent intervals holding a longer axle vertically and making waters slant at specified angle of theta while holding the first jig to shift wafers in parallel with one another. CONSTITUTION:A jig 22 containing wafer carriers is rotated around an axle 29 to be shifted to wafer shifting position. When a boat 10 is lowered to stop at the shifting position, a slide table 45 is slide leftward to shift a right side wafer holding member 55 leftward through the space between holding bars of boat 10 while a left side wafer holding member 54 is simultaneously inserted into a bottom hole of another jig 23 and carriers 22 holding wafers between the members 54 and 55 to be led out of the carriers 22. At this time, wafers meet the horizontal plane at an angle of 0<=theta<=30 deg. due to the gradient of bed 30 to be inserted into the grooves of holding bars of boat 10. Finally the members 54, 55 are retracted respectively rightward and leftward after insertion of wafers to get the wafers held by holding bars only and vertically arrayed.
申请公布号 JPS61144821(A) 申请公布日期 1986.07.02
申请号 JP19840268024 申请日期 1984.12.19
申请人 DEISUKO SAIYAA JAPAN:KK 发明人 GIYUNTAA SHIYUTETSUKURIN
分类号 H01L21/677;H01L21/22;H01L21/67 主分类号 H01L21/677
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