发明名称 PHOTOPOLYMERISABLE RESINS
摘要 <p>Diacrylates or dimethacrylates, which are compatible with water before exposure to actinic radiation but after such exposure form hard, insoluble, coatings which are resistant to organic solvents and to water, are made by reaction with (meth)acrylic acid, or with a dicarboxylic acid and a hydroxy group-containing (meth)acrylate, of epoxide groups in an advanced diepoxide resin containing groups of formula < IMG > where R4 denotes a divalent (cyclo)aliphatic or araliphatic radical, each R15 denotes an alkyl group or each pair of R15 denotes a group formula (-CH2)2-, -C(R16R17)CO-, -CH2CH(CH3)-, (-CH2-)3, or (-CO-)2, wherein R16 and R17 each represent a hydrogen atom, an alkyl group, or, conjointly, a cycloaphatic ring, and c is zero or 1.</p>
申请公布号 CA1194250(A) 申请公布日期 1985.09.24
申请号 CA19820406754 申请日期 1982.07.07
申请人 CIBA-GEIGY AG 发明人 HATHAWAY, RODERICK D.;IRVING, EDWARD;WATERHOUSE, JOHN S.
分类号 C08F2/46;C08F2/48;C08F20/36;G03F7/027;(IPC1-7):C08G59/17;B05D3/06 主分类号 C08F2/46
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