| 摘要 |
PURPOSE:To increase the adhesive force between a quartz glass substrate and a light shielding film and to prevent the exfoliation of a mask pattern by introducing an impurity reacting with the material of the light shielding layer into the surface region of the substrate. CONSTITUTION:Quartz glass is used as a substrate 1 and calcium ions are implanted as an impurity reacting with the material forming a light shielding film to form an impurity introduced layer 2 having several - several tens A thickness. Chromium or chromium oxide is deposited by sputtering as a light shielding film 3 to about 1,000A thickness on the surface of the substrate. A mask pattern is formed by an ordinary process on the above-mentioned blank. The entire surface of the substrate is plasma-etched, if necessary, in order to remove the impurities on the substrate surface exposed as a result of formation of the above-mentioned mask pattern. Calcium is used as an impurity to be introduced into the substrate and the other material which reacts with the material forming the light shielding material, for example, sodium, chlorine, bromine, etc. are also usable. |
