| 摘要 |
PURPOSE:To obtain a silver halide photosensitive material sufficiently antistaticized, prevented from sticking of processed prints to each other, and staining of a processing bath, a printer, etc., and capable of clearly retaining types formed on the surface of a backing layer even after development processing, by specifying the compsn. of the polymer latex of the backing layer. CONSTITUTION:The backing layer of a silver halide photosensitive material contains colloidal silica and a polymer latex. This latex is an emulsion of a copolymer or this copolymer neutralized with an acid, obtained by copolymerizing (a) acrylic acid or methacrylic acid in an amt. of 1.0-5.0wt% of the total monomers, (b) 5.0-20wt% styrenesulfonic acid, and (c) lower alkyl acrylate, and (d) styrene both weighing the rest in a c/d weight ratio of 1.0/1.0-2.0/1.0. As such a polymer latex, an aq. dispersion of a water-insoluble polymer, such as acrylic or vinyl acetate type latex, having an average particle diameter of 20-200mum can be used. |
