发明名称 |
SEMICONDUCTOR STRUCTURE WITH ALPHA-RAY RESISTANT FILM AND METHOD OF PRODUCING SAME |
摘要 |
An applique of a prepatterned film of alpha particle resistant material, such as polyimide, is applied to a semiconductor wafer. The prepatterned film covers only the critical areas e.g. those affected by alpha particle impingement. Bond pads and scribe streets are not covered by the applique. |
申请公布号 |
JPS60183750(A) |
申请公布日期 |
1985.09.19 |
申请号 |
JP19850022131 |
申请日期 |
1985.02.08 |
申请人 |
FAIRCHILD CAMERA & INSTRUMENT CORP |
发明人 |
MAIKERU BURATSUGUMEN;JIEEMUZU KURAAKU;UIRIAMU FUAI |
分类号 |
H01L23/29;H01L23/31;H01L23/556 |
主分类号 |
H01L23/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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