| 摘要 |
PURPOSE:To obtain a photoconductive material superior in adhesion to a substrate and printing resistance, and high in sensitivity also to long wavelength light enough to be brought into practice by forming a photoconductive layer contg. N and an element of group IIIb as an impurity in a concn. distribution increasing near an interface, controlling a conduction type exactly, and enabling matching near the interface of a conduction band. CONSTITUTION:A photoconductive member 101 has a laminated 3-layer structure of a surface protective layer 103, a photoconductive layer 102, and a conductive substrate 104 from above downward, or one layer made of a-Si contg. at least O, N, or C is added to said 3 layers to form a 4-layer structure of the surface protective layer 203, a photoconductive layer 202, a newly added undercoat layer 205, and the conductive substrate 204, from above. The presence of this layer 205 can improve adhesion between the conductive substrate and the photoconductive layer 202, and it can prevent peeling of the films and injection of electrostatic charge from the conductive substrate 204. |
