| 摘要 |
PURPOSE:To enable a photoresist film to be formed into a desired thickness and with a good flatness, by providing a wall around the peripheral edge of a rotary table such that the level of the upper face of the wall can be adjusted in the range to be higher than the upper face of a material by an appropriate amount. CONSTITUTION:The top 14 of a ring member 13 is adjusted to be higher than the upper face of a sample 20 mounted at the center of a rotary table 11 by a thickness of a photoresist film to be formed on that surface. Photoresist material having a viscosity somewhat lower than an ordinary one is dropped down to the center if the sample 20 with a rotary shaft 12 rotated. The photoresist material is caused to flow to the peripheral edge of the rotary table 11 by the centrifugal force but obstructed by the wall face of the ring member 13, so that the photoresist material 13 protrudes upward and the part of the material exceeding the level of the top 14 only is dispersed around. The photoresist material is cured while the surface of the photoresist material is kept flat to have the level equal to that of the top 14 of the wall. When the photoresist material is completely cured, the rotation of the unit 10 is stopped and the photoresist film on the outside of the material 20 is removed. |
