| 摘要 |
PURPOSE:To enhance the durability of an electric field curtain apparatus using a dielectric sheet comprising an org. material, by forming a dielectric film comprising an inorg. material to the surface of said dielectric sheet. CONSTITUTION:A silicon oxide film is formed to the surface of a dielectric sheet 3 by low temp. plasma CVD using silane and oxygen to protect the surface of said dielectric sheet by the silicon oxide film 5. As a result, the collision of ozone, an oxygen raical and various ions generated by corona discharge in the dielectric sheet 3 comprising a polyimide film, and the deterioration and degeneration of said sheet in the vicinity of an electrode where the concentration degree of an electric field is especially large are reduced and the generation of dielectric breakdown of said sheet 3 can be prevented even in long-time operation and the durability of an electric field curtain apparatus using said dielectric sheet 3 comprising the polyimide film can be enhanced. Further, the dielectric sheet 3 may be constituted of other org. materials if a dielectric film comprising an inorg. material is formed. |
