发明名称 Electron beam sensitive resist
摘要 This invention describes an improved ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a metal complex of a mixed half-ester or half amide product of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting a metal salt with the mixed half-ester or half-amide product of the reaction of an N-hydroxy or N-amino alkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkyl vinyl ether-maleic anhydride copolymer.
申请公布号 US4542090(A) 申请公布日期 1985.09.17
申请号 US19840597151 申请日期 1984.04.05
申请人 GAF CORPORATION 发明人 LEWIS, DAVID F.
分类号 C08F8/44;G03F7/038;(IPC1-7):C08F8/14 主分类号 C08F8/44
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