Inhibitor-containing acid cleaning compositions and processes

摘要

Acid cleaning compositions containing an inhibitor for cleaning metal surfaces, processes for cleaning metal surfaces therewith, and concentrates useful in forming the acid cleaning compositions. The present acid cleaning compositions contain an acid, a Mannich base, a thiourea, an alkyl trimethyl ammonium halide and/or an alkyl (C8-C9) phenoxypolyethoxy ethanol, and a nonionic surfactant which is a condensate of poly(oxyethylene) and poly(oxypropylene) groups.