| 摘要 |
PURPOSE:To enable the measurement of the film thickness over the entire deposited surface in the measurement of the film thickness of a film deposited on a substrate by gauging the evaporation speed over the entire area of the deposited surface with a film thickness measuring sensor movable freely by a driver. CONSTITUTION:A crucible 2 is heated with a vacuum vessel 1 vacuum inside and a metal steam is jetted out to form a deposited film on a substrate 4. A shutter 6 prevents metal from evaporation on the substrate 4 during the measurement with a film thickness measuring sensor 3. The sensor 3 mounted on a support rod 7a is so arranged to be movable freely with a driving mechanism 7. Then, first, with the shutter 6 positioned in front of the deposited surface of the substrate 4, the sensor 3 is set at any position of the deposited surface with the driving mechanism 7 through the support rod 7a to measure the evaporation speed over the entire deposited surface. Subsequently, the shutter 6 is moved and metal is deposited on the substrate 4. Then, the deposited film thickness is measured over the entire deposited surface. |
