| 摘要 |
PURPOSE:To form continuous pattern on a substrate having a comparatively large area by holding a substrate to which a pattern is transferred by a holder on which two or more alignment marks arranged in the predetermined positional relation are formed. CONSTITUTION:The alignment marks 4a, 4b, 5a, 5b are formed on a holder 3 and these are positioned in the predetermined positional relation each other for the center line C of pattern transfer region 1. For example, in case a pattern is transferred first to the upper half region of pattern transfer region 1, the mask 6a is arranged above or upper part of upper half region of substrate S, position of mask 6A for the substrate is adjusted by the alignment marks 4a, 4b, 8a, 8b until the interval between the bar element 10 of alignment mark 8 and alignment mark 4 becomes equal. Thereby, the pattern forming element formed on the mask 6A is transferred to the upper half region of the pattern transfer region 1. Next, similar pattern transfer is carried out for the lower half region of pattern transfer region 1. |
