发明名称 CONTROLLED VACUUM ARC MATERIAL DEPOSITION, METHOD AND APPARATUS
摘要 <p>A method and apparatus for vacuum arc deposition of material on a surface of an object (32), uses a vacuum chamber (12) accomodating the active surface of the cathode (24) and an anode (34). A power supply connected to the anode (34) and cathode (24) establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet (56) that is moved in a closed path relative to the cathode. A solenoid (68) modifies the main magnetic field produced on the active surface of the cathode (24).</p>
申请公布号 WO1985003954(A1) 申请公布日期 1985.09.12
申请号 US1985000312 申请日期 1985.02.27
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