| 摘要 |
PURPOSE:To remove a photo resist film at a low temperature and moreover safely by a method wherein ferment or bacteria are used. CONSTITUTION:To remove a photoresist film on the surface of a semiconductor wafer or a glass mask, etc., a solution containing ferment or the polyphagous bacteria thereof to dissolve synthetic cyclized rubber or phenolic resin, etc. being the fundamental material of the film thereof are used. The photo resist film can be removed by immersing in the solution of 40 deg.C at the utmost, and bacteria reduction process according to high temperature water or disinfectant water, or rinsing and drying are performed in succession. According to this construction, the photo resist can be removed safely without generating contamination of environment due to an offensive smell at a low temperature. |
