| 摘要 |
A process is disclosed for preparing R3SiNH-containing hydrosilazane polymer by contacting and reacting trichlorosilane with a disilazane [R3Si]2NH where R is vinyl, hydrogen, phenyl, or alkyl radicals containing 1 to 3 carbon atoms. These hydrosilazane polymers are useful, when fired at high temperatures, in the formation of silicon nitride and silicon nitride-containing ceramic materials.
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