发明名称 Device for the projection printing of masks into a workpiece
摘要 In order to determine magnification and/or alignment in a device for the projection printing of a pattern on a mask onto a substrate an adjustment plate insertable below the projection lens is provided, said adjustment plate being provided with light-transmitting zones conjugated with recesses in the mask in respect of the projection lens in the exposure light, photometer means being arranged below said light-transmitting zones.
申请公布号 US4540277(A) 申请公布日期 1985.09.10
申请号 US19830507549 申请日期 1983.06.24
申请人 PERKIN-ELMER CENSOR ANSTALT 发明人 MAYER, HERBERT;LOEBACH, ERNST
分类号 G03F9/00;(IPC1-7):G03B27/42 主分类号 G03F9/00
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