发明名称 |
Device for the projection printing of masks into a workpiece |
摘要 |
In order to determine magnification and/or alignment in a device for the projection printing of a pattern on a mask onto a substrate an adjustment plate insertable below the projection lens is provided, said adjustment plate being provided with light-transmitting zones conjugated with recesses in the mask in respect of the projection lens in the exposure light, photometer means being arranged below said light-transmitting zones.
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申请公布号 |
US4540277(A) |
申请公布日期 |
1985.09.10 |
申请号 |
US19830507549 |
申请日期 |
1983.06.24 |
申请人 |
PERKIN-ELMER CENSOR ANSTALT |
发明人 |
MAYER, HERBERT;LOEBACH, ERNST |
分类号 |
G03F9/00;(IPC1-7):G03B27/42 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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