| 摘要 |
PURPOSE:To uniformly disperse without reducing treating velocity by raising treating gas along the inner wall of a discharge tube, combining at the end and mixing. CONSTITUTION:A vacuum chamber 8 and a discharge tube 3 are maintained therein by a vacuum evacuation unit 9 at the prescribed pressure. A microwave generated by a microwave generator 1 is transmitted through a waveguide 2, and absorbed into the tube 3. Etching gas of treating gas discharged from treating gas discharging means such as a discharge tube 23 into the tube 3 is converted into a plasma by an electric field by the microwave and an external magnetic field by solenoid coils 4, 5, thereby etching a wafer 10 on a sample placing electrode 6. Since the three tubes 13 are provided at 120 deg. interval between the tube 3 and the electrode 6, the etching gas rises along the inner wall of the tube 3, combines at the end, and mixed. Thus, it is uniformly dispersed. |
