| 摘要 |
PURPOSE:To uniformly emit a light to the entire surface of a wafer without applying a fluctuation or a rotation to the wafer itself by providing a reflecting plate behind a light source, and enabling to normally or reversibly rotate the light source as the substantial center at the prescribed rotating angle. CONSTITUTION:Light sources 21 arranged at the prescribed pitch are arranged as opposite upper and lower pairs of a heating furnace. A reflecting plate 23 made of a parabolic mirror having a mirror surface formed substantially in a parabolic shape in section is disposed behind the light sources 21, and the light sources 21 are displaced from the focal position of the mirror slightly to the plate 23 side. The plate 23 made of the parabolic mirror is projected at the base with a supporting frame 25, and a shaft 27 is secured to the prescribed position of the frame 25. The shaft 27 is freely slidable in a frame 31. |
