| 摘要 |
PURPOSE:To improve preservability of a photosensitive liquid and to increase resistance to dry etching of a photosensitive composition by incorporating a novolak resin contg. beta-naphthol as a condensation component in a binder resin. CONSTITUTION:The novolak resin is one prepd. by condensing a condensation component contg. (a) 5-70mol% beta-naphthol, and (b) 30-95mol% at least one kind selected from phenol, cresol and xylenol, with formaldehyde. When beta- naphthol is <5mol%, the distinct improvement of resistance to dry etching of the photosensitive compsn. is not attained. When it is >70mol%, the solubility of the compsn. in a developing liquid is inferior, and only a compsn. having inferior photosensitivity is obtd. Preferred weight average mol.wt. of the novolak resin is 800-10,000. Suitable 1,2-naphthoquinone diazide compd. is tri-1,2- naphthoquinone-2-diazide-5-sulphonic acid ester of 2,3,4-trihydroxy benzophenone. |
