发明名称 |
METHOD AND DEVICE FOR ANALYZING SURFACE OF MOVING MATERIAL |
摘要 |
PURPOSE:To enable measurement of a characteristic X-ray having >=0.25nm wavelength by providing a fluorescent X-ray analyzing device which contains an X-ray source and a detector for the characteristic X-ray and is evacuated internally to a vacuum or is substd. with He and substituting the air in the space of an X-ray passage with He. CONSTITUTION:The body part of a fluorescent X-ray analyzing device has an X-ray source 1, a detector 5 for a characteristic X-ray and a housing 7 which contains said source and detector, has an X-ray transmission window 6 and is evacuated to a vacuum or substd. with helium in the inside X-ray passage part. A gas substituting chamber 8 having an opened bottom and a preliminary chamber 9 for gas substitution which encloses the circumference of said chamber and has an open bottom are provided. The detector 5 detects the generated characteristic X-ray and the window 6 isolates the vacuum part or helium substd. part in the housing from the outside. The air in the X-ray passage part is substd. with helium and the characteristic X-ray having >=0.25nm wavelength is made measurable in the stage of performing fluorescent X-ray analysis on the surface of a flat plate-shaped material. |
申请公布号 |
JPS60173448(A) |
申请公布日期 |
1985.09.06 |
申请号 |
JP19840029949 |
申请日期 |
1984.02.20 |
申请人 |
SHIN NIPPON SEITETSU KK |
发明人 |
HASHIGUCHI HIDEHIRO;OOTSUBO TAKASHI |
分类号 |
G01N23/223;(IPC1-7):G01N23/223 |
主分类号 |
G01N23/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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