| 摘要 |
PURPOSE:To reduce the heating time while improving the throughout of exposure, by heating material in a preliminary chamber which has been evacuated according to a previously set heating pattern. CONSTITUTION:In a electron-beam exposure unit, a material chamber 11 is connected to a preliminary chamber 15 through a gate valve 14. Over the material chamber 11 provided is an electron-beam optical barrel 20 comprising an electron gun 16, a lens system 17, a deflection system 18 and an aperture mask 19. an electron beam is irradiated to a material 12 in the chamber 11 by the optical barrel 20 so that the material 12 is exposed in a desired pattern. A heating member 21 such as nichrome wire is provided in the preliminary chamber 15 while a heating control unit 22 is provided for controlling the heating of the material 12 by this heating member 21 according to a previously set heating pattern. The temperature of the material 12 can be thereby rapidly controlled to the predetermined set temperature after the preliminary chamber 15 is evacuated. |
